000			00742nam a2200277Ia 4500
001			24154
005			20250221152315.0
008			250214s9999||||xx |||||||||||||| ||und||
020			_a0-07-113913-3
100			_aSmith, Donald L
245		0	_aThin-film deposition : principles and practice
260			_aNew York
260			_bMcGraw-Hill
260			_c1995
300			_axxiii, 616p: ill.
500			_aIncludes bibliographical references and index.
650			_aEpitaxy
650			_aGas kinetics
650			_aPhysics
650			_aThin film -- Deposition
650			_aThin film -- Evaporation and deposition
650			_aThin film devices
650			_aVacuum technology
650			_aVapor-plating
942			_cBK
999			_c40083 _d40083